Chemical kinetics of mobile-proton generation and annihilation in SiO2 thin films

Applied Physics Letters

Volumn 73, Issue 5, 1998, Pages 674-676

  Vanheusden, K ^a   Warren, W L ^b   Fleetwood, D M ^b   Schwank, J R ^b   Shaneyfelt, M R ^b   Draper, B L ^b   Winokur, P S ^b   Devine, R A B ^c   Archer, L B ^d   Brown, G A ^d   Wallace, R M ^d  

^a AIR FORCE RESEARCH LABORATORY   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c ORANGE LABS   (France)

^d TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002868599     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.121944     Document Type: Article

References (14)

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