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Volumn 72, Issue 1, 1998, Pages 79-81
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Positive charging of thermal SiO2/(100)Si interface by hydrogen annealing
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0001818038
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.120650 Document Type: Article |
Times cited : (36)
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References (19)
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