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Volumn 72, Issue 1, 1998, Pages 79-81

Positive charging of thermal SiO2/(100)Si interface by hydrogen annealing

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0001818038     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120650     Document Type: Article
Times cited : (36)

References (19)
  • 1
    • 0000412893 scopus 로고
    • See, e.g.
    • See, e.g., Y. C. Cheng, Prog. Surf. Sci. 8, 181 (1977), and references therein.
    • (1977) Prog. Surf. Sci. , vol.8 , pp. 181
    • Cheng, Y.C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.