CD control comparison of step & repeat versus step & scan DUV lithography for sub-0.25 μm gate printing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 56-66

  Ronse, Kurt G ^a   Maenhoudt, Mireille ^a   Marschner, Thomas ^a   Van Den Hove, Luc ^a   Streefkerk, Bob ^b   Finders, Jo ^b   Van Schoot, Jan B ^b   Luehrmann Jr , Paul F ^b   Minvielle, Anna Maria ^c  

^a IMEC   (Belgium)

^b ASML   (Netherlands)

^c ADVANCED MICRO DEVICES   (United States)

Author keywords

Aberration; CD control; Deep UV lithography; Electrical linewidth measurements; Metrology; Scanning electron microscopy; Step repeat; Step scan

Indexed keywords

ABERRATIONS; ELECTRON MICROSCOPY; INTEGRATED CIRCUITS; KRYPTON; LINEWIDTH; LITHOGRAPHY; MICROMETERS; OPTICAL INSTRUMENTS; OPTICAL RESONATORS; SCANNING; SCANNING ELECTRON MICROSCOPY; THICKNESS MEASUREMENT;

ABERRATION; CD CONTROL; DEEP-UV LITHOGRAPHY; ELECTRICAL LINEWIDTH MEASUREMENTS; METROLOGY;

DATA STORAGE EQUIPMENT;

EID: 0002314397     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310789     Document Type: Conference Paper

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