Lithography strategies for 180-nm CMOS device fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3096, Issue , 1997, Pages 2-10

  Arnold, William H ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; FABRICATION; MASKS; MICROCOMPUTERS; RANDOM ACCESS STORAGE; TECHNOLOGY; ULTRAVIOLET RADIATION;

DRAM; EXTREME ULTRAVIOLET PROJECTION; ION PROJECTION; SCANNING PROJECTION ELECTRON BEAM;

PHOTOLITHOGRAPHY;

EID: 0031341567     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.277248     Document Type: Conference Paper

References (8)