Fracture tests of etched components using a focused ion beam machine

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4180, Issue 1, 2000, Pages 40-48

  Kuhn, Jonathan L ^a   Fettig, Rainer K ^b   Moseley, S Harvey ^a   Kutyrev, Alexander S ^b   Orloff, Jon ^c  

^a NASA GODDARD SPACE FLIGHT CENTER   (United States)

^b Raytheon ITSS   (United States)

^c UNIVERSITY OF MARYLAND   (United States)

Author keywords

Fatigue; Fracture; Hinge; Micro shutters; Silicon nitride; Stiffness; Strength; Torsion

Indexed keywords

CYCLIC LOADS; FOCUSING; FRACTURE MECHANICS; FRACTURE TESTING; ION BEAMS; PIEZOELECTRIC DEVICES; PROBABILITY DISTRIBUTIONS; REACTIVE ION ETCHING; SILICON NITRIDE; STIFFNESS; STRENGTH OF MATERIALS; STRESS ANALYSIS;

FOCUSED ION BEAM MACHINES;

MICROELECTROMECHANICAL DEVICES;

EID: 0034541715     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.395707     Document Type: Article

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