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Volumn 78, Issue 5, 2001, Pages 598-600

Two-dimensional profiling and size effects on the transient enhanced diffusion of ultralow-energy B implants in Si

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Indexed keywords


EID: 0001735118     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1343501     Document Type: Article
Times cited : (21)

References (11)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.