Investigation of ultrathin SiO2 film thickness variations by ballistic electron emission microscopy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 4, 1998, Pages 2302-2307

  Kaczer, B ^a   Im, H J ^a   Pelz, J P ^a  

^a OHIO STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001649434     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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