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Volumn 2724, Issue , 1996, Pages 692-699
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Highly absorbing ARC for DUV lithography
a a a a a a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
ANTIREFLECTION COATINGS;
CROSSLINKING;
ETCHING;
PHOTORESISTS;
THICKNESS MEASUREMENT;
THIN FILMS;
CRITICAL DIMENSIONS;
SPIN-ON ORGANIC COATINGS;
LITHOGRAPHY;
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EID: 0029774844
PISSN: None
EISSN: None
Source Type: None
DOI: 10.1117/12.241867 Document Type: Conference Paper |
Times cited : (12)
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References (9)
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