Metal diffusion barriers for porous SiO2

Journal of Applied Physics

Volumn 87, Issue 7, 2000, Pages 3567-3569

  Kumar, A ^a   Bakhru, H ^a   Jin, C ^b   Lee, W W ^b   Lu, T M ^c  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b TEXAS INSTRUMENTS   (United States)

^c RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001619965     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.372381     Document Type: Article

References (11)

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2. For review see, W. W. Lee and P. S. Ho, Mater. Res. Bull. 22, 19 (1997); C. Chiang, P. S. Ho, T.-M. Lu, and J. T. Wetzel, Mater. Res. Soc. Symp. Proc. 511, 1 (1998).
3. T. C. Nason, J. A. Moore, and T.-M. Lu, Appl. Phys. Lett. 60, 1866 (1992); and references therein.
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8. C. Jin, J. D. Luttmer, D. M. Smith, and T. A. Ramos, Mater. Res. Bull. 22, 39 (1997).
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