Thermal stability of plasma deposited thin films of hydrogenated carbon-nitrogen alloys

Journal of Applied Physics

Volumn 86, Issue 11, 1999, Pages 6276-6281

  Anguita, J V ^a   Silva, S R P ^a   Burden, A P ^a   Sealy, B J ^a   Haq, S ^b   Hebbron, M ^b   Sturland, I ^b   Pritchard, A ^b  

^a UNIVERSITY OF SURREY   (United Kingdom)

^b BAE SYSTEMS   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001477915     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371685     Document Type: Article

References (31)

1. P. Koidl, Ch. Wild, B. Dischler, J. Wagner, and M. Ramsteiner, Mater. Sci. Forum 52&53, 41 (1989).
2. B. Dischler, A. Bubenzer, and P. Koidl, Solid State Commun. 48, 105 (1983).
3. B. Dischler, A. Bubenzer, and P. Koidl, Appl. Phys. Lett. 42, 636 (1983).
4. M. Weiler, S. Sattel, K. Jung, H. Ehrhardt, V. S. Veerasamy, and J. Robertson, Appl. Phys. Lett. 64, 1 (1994).
5. S. R. P. Silva, G. A. J. Amaratunga, and C. P. Constantinou, J. Appl. Phys. 72, 1149 (1992).
6. G. A. J. Amaratunga, and S. R. P. Silva, Appl. Phys. Lett. 68, 2529 (1996).
7. S. R. P. Silva and G. A. J. Amaratunga, Thin Solid Films 270, 194 (1995).
8. B. Meyerson and F. W. Smith, Solid State Commun. 41, 68 (1982).
9. D. I. Jones and A. D. Stewart, Philos. Mag. B 46, 423 (1982).
10. C. A. Davis, D. R. McKenzie, Y. Yin, E. Kravtchinskaia, G. A. J. Amaratunga, and V. S. Veerasamy, Philos. Mag. B 69, 1133 (1994).
11. S. R. P. Silva, B. Rafferty, G. A. J. Amaratunga, J. Schwan, D. F. Franceschini, and L. M. Brown, Diamond Relat. Mater. 5, 401 (1996).
12. V. S. Veerasamy, J. Yuan, G. A. J. Amaratunga, W. I. Milne, K. W. R. Gilkes, M. Weiler, and L. M. Brown, Phys. Rev. B 48, 17954 (1993).
13. S. R. P. Silva, J. Robertson, G. A. J. Amaratunga, B. Rafferty, L. M. Brown, J. Schwan, D. F. Franceschini, and G. Mariotto, J. Appl. Phys. 81, 2626 (1997).
14. R. C. Barklie, M. Collins, J. Cunniffe, and S. R. P. Silva, Diamond Relat. Mater. 7, 864 (1998).
15. R. A. Street, Hydrogenated Amorphous Silicon (Cambridge University Press, Cambridge, U.K., 1991), p. 57.
16. P. Stumm, D. A. Drabold, and P. A. Fedders, J. Appl. Phys. 81, 1289 (1997).
17. S. R. P. Silva, R. Khan, A. P. Burden, J. V. Anguita, J. Shannon, B. Sealy, A. Papworth, C. Kielly, and G. A. J. Amaratunga, Thin Solid Films 332, 118 (1998).
18. A. P. Burden, E. Mendoza, S. R. P. Silva, and G. A. J. Amaratunga, Diamond Relat. Mater. 7, 495 (1998).
19. M. Zhang and Y. Nakayama, J. Appl. Phys. 82, 4912 (1997).
20. W. J. Varhue, K. A. Pandelisev, and B. S. Shinseki, J. Appl. Phys. 67, 3835 (1990).
21. J. Schwan, W. Dworschak, K. Jung, and H. Ehrhardt, Diamond Relat. Mater. 3, 1034 (1994).
22. H. X. Han and B. J. Feldman, Solid State Commun. 65, 921 (1988).
23. H. Kaufman, S. Metin, and D. Saperstein, Phys. Rev. B 39, 13053 (1989).
24. N. Mutsukura, S. Inoue, and Y. Machi, J. Appl. Phys. 72, 43 (1992).
25. N. M. J. Conway, A. Ilie, J. Robertson, W. I. Milne, and A. Tagliaferro, Appl. Phys. Lett. 73, 2456 (1998).
26. D. H. Williams and I. Flemming, Spectroscopic Methods in Organic Chemistry (McGraw-Hill, London, UK, 1995), p. 70.
27. D. Oxtoby and N. Nachtrieb, Principles of Modern Chemistry (CBS, Philadelphia, 1986), p. 450.
28. J. Viehland, S. Lin, and B. J. Feldman, Solid State Commun. 80, 597 (1991).
29. S. Lin, K. Noonan, B. Feldman, D. Min, and M. T. Jones, Solid State Commun. 80, 101 (1991).
30. O. Amir and R. Kalish, J. Appl. Phys. 70, 4958 (1991).
31. D. Mendoza, J. A. Hernández, and G. C. Puente, Solid State Commun. 84, 1025 (1992).