Mechanisms of cluster implantation in silicon: A molecular-dynamics study

Physical Review B - Condensed Matter and Materials Physics

Volumn 58, Issue 16, 1998, Pages 10736-10744

  Ihara, Sigeo ^a   Itoh, Satoshi ^a   Kitakami, Jun’ichi ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001390429     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.58.10736     Document Type: Article

References (25)

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