Evaluation of scanning Maxwell-stress microscopy for SPM-based nanoelectronics

Nanotechnology

Volumn 8, Issue 3 SUPPL. A, 1997, Pages

  Dagata, J A ^a,b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MICROSCOPIC EXAMINATION; OPTIMIZATION; OXIDATION; REACTION KINETICS; SEMICONDUCTING SILICON;

SCANNED PROBED MICROSCOPY (SPM); SCANNING MAXWELL STRESS MICROSCOPY (SMM);

NANOTECHNOLOGY;

EID: 0031237525     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/8/3A/002     Document Type: Review

References (16)

1. Dagata JA 1995 Science 270 1625 and references therein
2. Dagata JA 1992 J. Vac. Sci. Technol. A 10 2105
3. Dagata J A and Marrian C R K 1993 Technology of Proximal Probe Lithography vol IS10, ed CRK Marrian (Bellingham, WA: SPIE) p 3
4. Minne S C et al 1995 Appl. Phys. Lett. 66 703
5. Campbell P M, Snow E S and McMarr P J 1995 Appl. Phys. Lett. 66 1308
6. Matsumoto K et al 1995 Japan. J. Appl. Phys. 34 L1387 Ishii M and Matsumoto K 1995 Japan. J. Appl. Phys. 34 L1329
7. Matsumoto K et al 1995 Japan. J. Appl. Phys. 34 L1387 Ishii M and Matsumoto K 1995 Japan. J. Appl. Phys. 34 L1329
8. Yokoyama H and Inoue T 1994 Thin Solid Films 242 33
9. Yokoyama H, Inoue T and Itoh J 1994 Appl. Phys. Lett. 65 3143
10. Dagata J A, Inoue T, Yokoyama H and Itoh J unpublished
11. Perez-Murano F et al 1995 J. Appl. Phys. 78 6797
12. Dagata J A, Karim A, Douglas J F, Yokoyama H and Itoh J unpublished
13. Steiner U et al 1994 Phys. Rev. Lett. 72 1498
14. Krausch G et al 1994 Appl. Phys. Lett. 64 2655
15. Koening R Thesis PTB-Braunschweig, Appendix A
16. Dagata J A, Diebold A C, Shih C K and Colton R J Industrial Applications of Scanned Probe Microscopy Workshop Reports NISTIR #5550 and 5752 (available from NTIS, Springfield, VA 22161)