Interactions between silica xerogel and tantalum

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 2, 2001, Pages 354-360

  Rogojevic, Svetlana ^a   Jain, Anurag ^a   Wang, Feng ^a   Gill, William N ^a   Wayner Jr , Peter C ^a   Plawsky, Joel L ^a   Lu, Toh Ming ^a   Yang, Guang Rong ^a   Lanford, William A ^b   Kumar, Atul ^b   Bakhru, Hassaram ^b   Roy, Alok Nandini ^b  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CONTACT ANGLE; DIFFUSION IN SOLIDS; GELS; INTERFACES (MATERIALS); OPTICAL MICROSCOPY; OXIDATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; STRUCTURE (COMPOSITION); TANTALUM; THERMAL EFFECTS;

SCOTCH TAPE TEST; SILICA XEROGEL;

THIN FILMS;

EID: 0001179347     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1347047     Document Type: Article

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