Evaluation of advanced epoxy novolac resist, EPR, for sub 100 nm synchrotron X-ray proximity lithography

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 461-464

  Seo, Yongduck ^a   Lee, Kyoungho ^a   Yi, Moonsuk ^a   Seo, Eunsung ^a   Choi, Bo Kyung ^a   Kim, Ohyun ^a   Raptis, Ioannis ^b   Argitis, Panayiotis ^b   Hatzakis, Michael ^b  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

EPOXY RESINS; PARAMAGNETIC RESONANCE; SYNCHROTRONS; X RAY LITHOGRAPHY;

POST EXPOSURE BAKING (PEB); SYNCHROTRON X RAY PROXIMITY LITHOGRAPHY;

ELECTRON BEAM LITHOGRAPHY;

EID: 0033132564     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00040-4     Document Type: Article

References (7)

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