Resist design considerations for direct write and projection electron-beam lithography technologies

Journal of Photopolymer Science and Technology

Volumn 9, Issue 4, 1996, Pages 663-676

  Novembre, Anthony E ^a   Berger, Steven D ^a   Biddick, Chris J ^a   Blakey, Myrtle I ^a   Bolan, Kevin J ^a   Fetter, Linus A ^a   Harriott, Lloyd R ^a   Huggins, Harold A ^a   Knurek, Chester S ^a   Alexander Liddle, J ^a   Mixon, David A ^a   Peabody, Milton L ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040257673     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.9.663     Document Type: Article

References (6)

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2. S. D. Berger and J. M. Gibson, Appl. Phys. Lett. 57(2), 9 July (1990).
3. O. Nalamasu, E. Reichmanis, A.G. Timko, R. Tarascon, A.E. Novembre, S. Slater, H. Holzwarth, P. Falcigno, N. Munzel, Microelectronic Eng., 27, 367 (1995)
4. R. G. Tarascon, A.E. Novembre, W.W. Tai, L.A. Fetter, J.M. Kometani, O. Nalamasu, Proc. SPIE, 2195, 258 (1994)
5. A.E. Novembre, J.M. Kometani, C.S. Knurek, U. Kumar, T.X. Neenan, D.A. Mixon, O. Nalamasu, N. Munzel, Microelectronic Eng. 27, 389 (1995)
6. G. P. Watson, S. D. Berger, J. A. Liddle, L. Fetter, R. Farrow, R. G. Tarascon, M. Mkrtchyan, A. E. Novembre, M. Blakey, K. Bolan, J. Vac. Sei. Technol. B, 13(6), 2404 (1995)