Patterning of membrane masks for projection e-beam lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2884, Issue , 1996, Pages 276-287

  Fetter, Linus A ^a   Biddick, Christopher J ^a   Blakey, Myrtle I ^a   Liddle, James A ^a   Peabody Jr , Milton L ^a   Novembre, Anthony E ^a   Tennant, Donald M ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

e beam; Lithography; Membrane; Reticle; SCALPEL

Indexed keywords

ELECTRON BEAMS; MEMBRANES; OPTICAL INSTRUMENTS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON NITRIDE; SILICON WAFERS; THICKNESS MEASUREMENT;

CD LINEARITIES; DATA FILES; E-BEAM; EDGE ROUGHNESSES; HIGH RESOLUTIONS; LITHOGRAPHIC CAPABILITIES; LITHOGRAPHY SYSTEMS; LITHOGRAPHY TOOLS; MASK BLANKS; MASK TECHNOLOGIES; MEMBRANE MASKS; MICRON RANGES; PATTERNING PROCESSES; PROXIMITY EFFECT CORRECTIONS; RETICLE; SCALPEL; TEST CHIPS; THICK RESISTS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0001733494     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.262810     Document Type: Conference Paper

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