Preliminary results from a prototype projection electron-beam stepper-scattering with angular limitation projection electron beam lithography proof-of-concept system

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 3825-3828

  Harriott, L R ^a   Berger, S D ^a,b   Biddick, C ^a   Blakey, M I ^a   Bowler, S W ^a   Brady, K ^a   Camarda, R M ^a   Connelly, W F ^a   Crorken, A ^a   Custy, J ^a   Dimarco, R ^a   Farrow, R C ^a   Felker, J A ^a   Fetter, L ^a   Freeman, R ^a   Hopkins, L ^a   Huggins, H A ^a   Knurek, C S ^a   Kraus, J S ^a   Liddle, J A ^a   Mkrtychan, M ^a   Novembre, A E ^a   Peabody, M L ^a   Tarascon, R G ^a   Wade, H H ^a   Waskiewicz, W K ^a   Watson, G P ^a   Werder, K S ^a   Windt, D ^a   more..

^a LUCENT TECHNOLOGIES   (United States)

^b Intetgrated Solutions Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON GUNS; ELECTRON OPTICS; ELECTRON SCATTERING; FABRICATION; IMAGING SYSTEMS; MASKS; OPTICAL DESIGN; OPTICAL TESTING; PROJECTION SYSTEMS; SCANNING ELECTRON MICROSCOPY; SYSTEMS ANALYSIS;

CRITICAL DIMENSION; ELECTRON OPTICAL SYSTEM; ELECTRON-ELECTRON INTERACTIONS; IMAGE BLUR; IMAGING OPTICS; PROJECTION ELECTRON BEAM STEPPER SCATTERING; PROJECTION OPTICS; PROOF OF CONCEPT TEST;

ELECTRON BEAM LITHOGRAPHY;

EID: 0030288794     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588675     Document Type: Article

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