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Volumn 11, Issue 4, 1998, Pages 613-618

Study of high photo-speed top surface imaging process using chemically amplified resist

Author keywords

Arf lithography; Chemically amplified resist; Line edge roughness; Photo speed; Process margin; Silylation

Indexed keywords


EID: 0000925357     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.11.613     Document Type: Article
Times cited : (5)

References (22)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.