Multi-generation device fabrication by ArF lithography

Technical Digest - International Electron Devices Meeting, IEDM

Volumn , Issue , 1997, Pages 933-935

  Mori, Shigeyasu ^a   Morisawa, Taku ^a   Matsuzawa, Nobuyuki ^a   Kaimoto, Yuko ^a   Endo, Masayuki ^a   Matsuo, Takahiro ^a   Takahashi, Makoto ^a   Naito, Takuya ^a   Naruse, Yoshiaki ^a   Kishimura, Shinji ^a   Takechi, Satoshi ^a   Yamaguchi, Atsuko ^a   Uematsu, Masaya ^a   Onodera, Toshio ^a   Nakazawa, Keisuke ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; COMPUTATIONAL METHODS; COPOLYMERS; EXCIMER LASERS; IMAGING TECHNIQUES; MASKS; PERCOLATION (SOLID STATE); PHOTOLITHOGRAPHY; PHOTORESISTS; POLYACRYLATES; SILICA;

LASER LITHOGRAPHY; PHASE SHIFTING MASKS (PSM); TOP SURFACE IMAGING (TSI) PROCESS;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 84886447968     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/iedm.1997.650535     Document Type: Conference Paper

References (0)