Diffusion kinetic of vapor-phase silylation process for ArF lithography

Journal of Photopolymer Science and Technology

Volumn 10, Issue 4, 1997, Pages 603-608

  Mori, Shigeyasu ^a   Matsuzawa, Nobuyuki ^a   Morisawa, Taku ^a   Kaimoto, Yuko ^a   Endo, Masayuki ^a   Matsuo, Takahiro ^a   Kuhara, Koichi ^a   Sasago, Masaru ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

Activation energy; ArF lithography; Fickian diffusion; Rate determining step; Silylation; Vapor phase

Indexed keywords

EID: 11744278505     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.10.603     Document Type: Article

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