Shear force surface contrast on self-assembly monolayers

Applied Physics Letters

Volumn 77, Issue 19, 2000, Pages 3110-3112

  Vaccaro, L ^a,b   Bernal, M P ^a   Marquis Weible, F ^a   Duschl, C ^a  

^a EPFL   (Switzerland)

^b UNIVERSITY OF NEUCHÂTEL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000457014     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1324728     Document Type: Article

References (11)

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7. 2 coated silicon wafer and shows an average roughness of approximately 0.25 nm.
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11. In this study electrostatic forces do not play a crucial role since on non-metallic samples there are neither free charges nor tip induced image charges.