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Journal of Non-Crystalline Solids

Volumn 266-269 B, Issue , 2000, Pages 1320-1324

a-Si:H thin film transistors after very high strain

(3) Gleskova, H a Wagner, S a Suo, Z a

a Princeton University (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000386312 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/s0022-3093(99)00944-8 Document Type: Article

Times cited : (75)

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