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Volumn 508, Issue , 1998, Pages 19-24

Reaction processes for low temperature (<150 °C) plasma enhanced deposition of hydrogenated amorphous silicon thin film transistors on transparent plastic substrates

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; HYDROGEN BONDS; LOW TEMPERATURE OPERATIONS; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASTICS; SILICON NITRIDE;

EID: 0032320537     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-508-19     Document Type: Conference Paper
Times cited : (16)

References (14)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.