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Volumn 508, Issue , 1998, Pages 19-24
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Reaction processes for low temperature (<150 °C) plasma enhanced deposition of hydrogenated amorphous silicon thin film transistors on transparent plastic substrates
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS SILICON;
HYDROGEN BONDS;
LOW TEMPERATURE OPERATIONS;
NITROGEN;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
PLASTICS;
SILICON NITRIDE;
CHARGE TRAPPING;
THIN FILM TRANSISTORS;
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EID: 0032320537
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-508-19 Document Type: Conference Paper |
Times cited : (16)
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References (14)
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