Characterization of silicon/oxide/nitride layers by x-ray photoelectron spectroscopy

Applied Physics Letters

Volumn 75, Issue 11, 1999, Pages 1535-1537

  Hansch, Walter ^a   Nakajima, Anri ^a   Yokoyama, Shin ^a  

^a HIROSHIMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000303160     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124747     Document Type: Article

References (14)

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