Spatial and temporal behavior of radicals in inductively coupled plasm for SiO2 etching

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 12 B, 1998, Pages 6922-6927

  Hayashi, Shigenori ^a   Yamanaka, Michinari ^a   Kubota, Masafumi ^a   Ogura, Mototsugu ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

Distribution; Etching; Inductively coupled plasma; Laser induced fluorescence; Radical

Indexed keywords

EID: 0000170328     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.6922     Document Type: Article

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