Characterization of low energy boron implantation and fast ramp-up rapid thermal annealing

Materials Research Society Symposium - Proceedings

Volumn 525, Issue , 1998, Pages 227-235

  Collart, E J H ^a   De Cock, G ^a   Murrell, A J ^a   Foad, M A ^a  

^a Applied Materials ^*  (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ION IMPLANTATION; RAPID THERMAL ANNEALING; SEMICONDUCTOR DEVICE MANUFACTURE;

ELECTRICAL ACTIVATION; SPIKE ANNEALS;

SEMICONDUCTING BORON;

EID: 0031643194     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)