Bias-assisted etching of polycrystalline diamond films in hydrogen, oxygen, and argon microwave plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 3, 1999, Pages 763-767

  Zhang, W J ^a   Sun, C ^a   Bello, I ^a   Lee, C S ^a   Lee, S T ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000112526     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581646     Document Type: Article

References (20)

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