(001)-textured growth of diamond films on polycrystalline diamond substrates by bias-assisted chemical vapor deposition

Journal of Crystal Growth

Volumn 171, Issue 3-4, 1997, Pages 485-492

  Zhang, W J ^a,b   Jiang, X ^a   Klages, C P ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

^b LANZHOU UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; DIAMONDS; MORPHOLOGY; RAMAN SCATTERING; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACE ROUGHNESS;

BIAS ASSISTED CHEMICAL VAPOR DEPOSITION; IN PLANE ORIENTED DIAMOND DOMAIN; PHASE PURITY; POLYCRYSTALLINE DIAMOND SUBSTRATES;

FILM GROWTH;

EID: 0031078931     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(96)00701-4     Document Type: Article

References (20)

1. C. Wild, P. Koild, W. Müller-Sebert, H. Walcher, R. Kohl, N. Herres, R. Locher, R. Samlenski and R. Brenn, Diamond Relat. Mater. 2 (1993) 158.
2. C. Wild, N. Herres and P. Koild, J. Appl. Phys. 68 (1990) 973.
3. C. Wild, P. Koild, N. Herres, W. Müller-Sebert and T. Eckermann, Eletrochem. Soc. Proc. 91 (1991) 224.
4. P. Zemann and E. Kay, J. Vac. Sci. Technol. A 1 (1983) 512.
5. T.C. Huang, G. Lim, F. Parmigiani and E. Kay, J. Vac. Sci. Technol. A 3 (1985) 2161.
6. A.N. Pilyankevich, V. Yu. Kulykovski and L.R. Shaginyan, Thin Solid Films 137 (1986) 215.
7. S. Yugo, T. Kanai, T. Kimura and T. Muto, Appl. Phys. Lett. 58 (1991) 1036.
8. X. Jiang, M. Paul, C.-P. Klages and C.L. Jia, in: Diamond Materials IV, Vol. 95-4, Eds. K.V. Ravi and J.P. Dismukes (The Electrochemical Society, Pennington, New Jersey, 1995) p. 50.
9. S. McGinnis, M. Kelly and S.B. Hagström, Appl. Phys. Lett. 66 (1995) 3117.
10. X. Jiang and C.-P. Klages, Diamond Relat. Mater. 2 (1993) 1112; X. Jiang, C.-P. Klages, R, Zachai, M. Hartweg and H.-J. Füsser, Appl. Phys. Lett. 62 (1993) 3438.
11. X. Jiang and C.-P. Klages, Diamond Relat. Mater. 2 (1993) 1112; X. Jiang, C.-P. Klages, R, Zachai, M. Hartweg and H.-J. Füsser, Appl. Phys. Lett. 62 (1993) 3438.
12. B. Stoner and J.T. Glass, Appl. Phys. Lett. 60 (1992) 698.
13. J.S. Lee, K.S. Liu and I.N. Lin, Appl. Phys. Lett. 67 (1995) 1555.
14. X. Jiang, W.J. Zhang, M. Paul and C.-P. Klages, Appl. Phys. Lett. 68 (1996) 1927.
15. W.J. Zhang and X. Jiang, Appl. Phys. Lett. 68 (1996) 2195.
16. A. Flöter, G. Schaarschmidt, B. Mainz, S. Laufer, S. Deutschmann and H.-J. Hinneberg, Diamond Relat. Mater. 4 (1995) 930.
17. R. Yamada and K. Sone, J. Nucl. Mater. 116 (1983) 200.
18. J.W. Davis, A.A. Haasz and P.C. Stangeby, J. Nucl. Mater. 145 (1987) 417.
19. K. Schiffmann and X. Jiang, Appl. Phys. A 59 (1994) 17.
20. J. Robertson, J. Gerber, S. Sattel, M. Weiler, K. Jung and H. Ehrhardt, Appl. Phys. Lett. 66 (1995) 3287.