Etching of nondiamond carbon in diamond thin films synthesized by hot-filament chemical vapor deposition with ultraviolet irradiation

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 3 SUPPL. A, 1997, Pages 1233-1237

  Ishikawa, Yutaka ^a   Yoshimi, Hideto ^a,c   Hirose, Yoichi ^b  

^a NIPPON INSTITUTE OF TECHNOLOGY   (Japan)

^b TOKAI UNIVERSITY   (Japan)

^c Toko Co   (Japan)

Author keywords

Diamond film; Low temperature; Oxygen; Selective etching of nondiamond carbon; UV irradiation

Indexed keywords

NONDIAMOND CARBON; SELECTIVE ETCHING;

CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; ETCHING; FILM GROWTH; LOW TEMPERATURE OPERATIONS; OXYGEN; THIN FILMS; ULTRAVIOLET RADIATION;

CARBON;

EID: 0031101470     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.1233     Document Type: Article

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