Anisotropic Si deep beam etching with profile control using SF 6/O2 Plasma

Microsystem Technologies

Volumn 10, Issue 8-9, 2004, Pages 603-607

  Zou, H ^a  

^a IMPERIAL COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; MICROACTUATORS; MICROSENSORS; OXYGEN; PRESSURE EFFECTS; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SILICON; SINGLE CRYSTALS; SULFUR COMPOUNDS;

ANISOTROPIC ETCHING; DARK SPACE VOLTAGE; ETCH CAVITY;

PLASMA ETCHING;

EID: 9944233543     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-003-0338-3     Document Type: Article

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