New pattern of stress relief behaviour in diamond-like carbon films grown by saddle-field fast atom beam source

Diamond and Related Materials

Volumn 13, Issue 10, 2004, Pages 1844-1847

  Sarangi, D ^a,b   Kumar, Sushil ^a   Bhattacharyya, R ^a  

^a NATIONAL PHYSICAL LABORATORY   (India)

^b ETH ZURICH   (Switzerland)

Author keywords

Diamond like carbon (DLC); Fast atom beam source (FAB); N2 doping; Stress

Indexed keywords

ACETYLENE; ATOMIC BEAMS; BUCKLING; COMPRESSIVE STRESS; DOPING (ADDITIVES); HARDNESS; HYDROGEN; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STRESS RELIEF;

FAST ATOM BEAM (FAB) SOURCE; N2 DOPING; SADDLE FIELDS; STRESS PER UNIT HARDNESS (SPUH);

DIAMOND LIKE CARBON FILMS;

EID: 9744275383     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2004.05.003     Document Type: Article

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