Enhancement of surface-damage resistance by removing subsurface damage in fused silica and its dependence on wavelength

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 43, Issue 9 AB, 2004, Pages

  Kamimura, Tomosumi ^a   Akamatsu, Shigenori ^b   Horibe, Hideo ^b   Shiba, Haruya ^b   Motokoshi, Shinji ^c   Sakamoto, Takayasu ^c   Jitsuno, Takahisa ^c   Okamato, Takayuki ^d   Yoshida, Kunio ^a  

^a OSAKA INSTITUTE OF TECHNOLOGY   (Japan)

^b KOCHI NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^c OSAKA UNIVERSITY   (Japan)

^d Okamoto Optics Works Co Ltd   (Japan)

Author keywords

Cerium dioxide (CeO2); Chemical etching; Fused silica; Ion beam etching; Subsurface damage; Superprecise polishing; Surface damage resistance

Indexed keywords

ARGON; CERIUM COMPOUNDS; CHEMICAL MECHANICAL POLISHING; ETCHING; GRINDING (COMMINUTION); ION BEAMS; IRRADIATION; LASER DAMAGE; MORPHOLOGY; SURFACE PHENOMENA; SURFACE ROUGHNESS;

CERIUM DIOXIDE (CEO2); CHEMICAL ETCHING; ION-BEAM ETCHING; LASER-INDUCED DAMAGE THRESHOLD (LIDT); SUBSURFACE DAMAGE; SUPERPRECISE POLISHING; SURFACE-DAMAGE RESISTANCE;

FUSED SILICA;

EID: 9144248712     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.L1229     Document Type: Article

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