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Volumn 1, Issue , 2004, Pages 585-590

Lateral compensation structures can break the silicon limit

Author keywords

[No Author keywords available]

Indexed keywords

BURIED OXIDE; COMPENSATION STRUCTURES; SUPERJUNCTION DEVICES; VOLTAGE POWER;

EID: 8744313899     PISSN: 02759306     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (4)

References (14)
  • 2
    • 0003142829 scopus 로고    scopus 로고
    • A new generation of high voltage MOSFETs breaks the limit line of silicon
    • Deboy, G., et al. A New Generation of High Voltage MOSFETs Breaks the Limit Line of Silicon, in IEDM. 1998.
    • (1998) IEDM
    • Deboy, G.1
  • 4
    • 21644467903 scopus 로고    scopus 로고
    • High-voltage devices > 600 V produced with a low-voltage (<150 V) smart-power IC technology
    • Rotter, T. and M. Stoisiek. High-Voltage Devices (> 600 V Produced with a Low-Voltage (<150 V) Smart-Power IC Technology, in ESSDERC. 2003.
    • (2003) ESSDERC
    • Rotter, T.1    Stoisiek, M.2
  • 5
    • 0034449647 scopus 로고    scopus 로고
    • A review of RESURF technology
    • Ludikhuize, A.W. A Review of RESURF Technology, in ISPSD. 2000.
    • (2000) ISPSD
    • Ludikhuize, A.W.1
  • 7
    • 0032046247 scopus 로고    scopus 로고
    • 3D resurf double-gate MOSFET: A revolutionary power device concept
    • Udrea, F., A. Popescu, and W.I. Milne, 3D Resurf Double-Gate MOSFET: A Revolutionary Power Device Concept. Electronics Letters, 1998. 34(8): p. 808-809.
    • (1998) Electronics Letters , vol.34 , Issue.8 , pp. 808-809
    • Udrea, F.1    Popescu, A.2    Milne, W.I.3
  • 9
    • 0031251517 scopus 로고    scopus 로고
    • Theory of semiconductor superjunction devices
    • Fujihira, T., Theory of Semiconductor Superjunction Devices. Jpn. J. Appl. Phys., 1997. 36: p. 6254-6262.
    • (1997) Jpn. J. Appl. Phys. , vol.36 , pp. 6254-6262
    • Fujihira, T.1
  • 10
    • 8744260693 scopus 로고    scopus 로고
    • Solid phase epitaxy for delta-doping in silicon
    • E.F. Schubert, Editor, Cambridge University Press
    • Eisele, I., Solid Phase Epitaxy for Delta-Doping in Silicon, in Delta-Doping of Semiconductors, E.F. Schubert, Editor. 1996, Cambridge University Press, p. 137-160.
    • (1996) Delta-doping of Semiconductors , pp. 137-160
    • Eisele, I.1
  • 11
    • 0002106257 scopus 로고
    • High voltage thin layer devices (resurf devices)
    • Appels, J.A. and H.M.J. Vaes. High Voltage Thin Layer Devices (Resurf Devices), in IEDM Tech. Dig. 1979.
    • (1979) IEDM Tech. Dig.
    • Appels, J.A.1    Vaes, H.M.J.2
  • 12


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.