Wide-Area Homoepltaxial Growth of 6H-SiC on Nearly On-Axis (0001) by Chemical Vapor Deposition

Materials Science Forum

Volumn 433-436, Issue , 2003, Pages 149-152

  Nakamura, Shun Ichi ^a   Kimoto, Tsunenobu ^a   Matsunami, Hiroyuki ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Atomic Force Microscopy AFM; Chemical Vapor Deposition CVD; Homoepitaxial Growth; Nearly On Axis (0001) Face; Surface Step Structures

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; EPITAXIAL GROWTH; MORPHOLOGY; NUCLEATION;

SURFACE STEP STRUCTURES;

SILICON CARBIDE;

EID: 0242581501     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: None     Document Type: Conference Paper

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