A new approach to spatially controllable CVD

Proceedings of the American Control Conference

Volumn 1, Issue , 2004, Pages 287-292

  Choo, Jae Ouk ^a   Adomaitis, Raymond A ^a   Rubloff, Gary W ^a   Henn Lecordier, Laurent ^a   Cai, Yuhong ^a  

^a UNIVERSITY OF MARYLAND   (United States)

Author keywords

Chemical vapor deposition; Distributed parameter systems; Semiconductor manufacturing

Indexed keywords

PROGRAMMABLE REACTORS; REACTOR SYSTEMS; THERMAL COUPLING;

CHEMICAL REACTORS; DISTRIBUTED PARAMETER CONTROL SYSTEMS; HEAT TRANSFER; MASS SPECTROMETERS; MATHEMATICAL MODELS; MICROELECTRONICS; THERMAL CONDUCTIVITY;

CHEMICAL VAPOR DEPOSITION;

EID: 8744229551     PISSN: 07431619     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)

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