Fabrication of suspended nanomechanical structures from bulk 6H-SiC substrates

Materials Science Forum

Volumn 457-460, Issue II, 2004, Pages 1531-1534

  Huang, X M H ^a   Feng, X L ^a   Prakash, M K ^a   Kumar, S ^a   Zorman, C A ^b   Mehregany, M ^b   Roukes, M L ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^b CASE WESTERN RESERVE UNIVERSITY   (United States)

Author keywords

6H SiC; Fabrication; Nanomechanical resonators

Indexed keywords

ANISOTROPY; ETCHING; MACHINING; MICROWAVES; NANOSTRUCTURED MATERIALS; PHOTOLITHOGRAPHY; RESONATORS; SILICON WAFERS;

6H-SIC; BEAM STRUCTURES; MICROWAVE FREQUENCIES; NANOMECHANICAL RESONATORS;

SILICON CARBIDE;

EID: 8644268890     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: None     Document Type: Conference Paper

References (8)

1. X. M. H. Huang, C. A. Zorman, M. Mehregany and M. L. Roukes: Nature Vol. 421 (2003), p. 496.
2. M. Mehregany, C. A. Zorman, N. Rajan and C. H. Wu: Proc. IEEE Vol. 86 (1998), p. 1594.
3. C. A. Zorman, A. J. Fleischman, A. S. Dewa, M. Mehregany, C. Jacob, S. Nishino, and P. Pirouz: J. Appl. Phys. Vol. 78 (1995), p. 5136.
4. Y. T. Yang, K. L. Ekinci, X. M. H. Huang, L. M. Schiavone, M. L. Roukes, C. A. Zorman and M. Mehregany: Appl. Phys. Lett. Vol. 78 (2001), p. 162.
5. X. M. H. Huang, C. A. Zorman, M. Mehregany and M. L. Roukes: "Quality factor issues in silicon carbide nanomechanical resonators," in Proc. 12th Inter. Conf. Solid-State Sensors, Actuators and Microsystems, Boston, MA, (2003), p. 722.
6. A. N. Cleland and M. L. Roukes: Appl. Phys. Lett. Vol. 69 (1996), p. 2653.
7. A. N. Cleland and M. L. Roukes: Nature Vol. 392 (1998), p. 160.
8. A. N. Cleland and M. L. Roukes: Sens. Actuator A Vol. 72 (1999), p. 256.