Fictive-temperature-dependence of photoinduced self-trapped holes in a – SiO2

Physical Review B - Condensed Matter and Materials Physics

Volumn 68, Issue 15, 2003, Pages

  Yamaguchi, M ^a,b   Saito, K ^a   Ikushima, J ^a  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

^b Japan Society for the Promotion of Machine Industry   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

GLASS; SILICON DIOXIDE;

ARTICLE; CHEMICAL STRUCTURE; ELECTRON SPIN RESONANCE; LASER; MEASUREMENT; TEMPERATURE DEPENDENCE;

EID: 85038980681     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.68.153204     Document Type: Article

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