Study on fabrication of high aspect ratio microparts using the LIGA process

MHS 1997 - Proceedings of 1997 International Symposium on Micromechatronics and Human Science

Volumn , Issue , 1997, Pages 49-54

  Ueno, H ^a   Hosaka, M ^a   Zhang, Y ^b   Tabata, O ^a   Konishi, S ^a   Sugiyama, S ^a  

^a RITSUMEIKAN UNIVERSITY   (Japan)

^b SUMITOMO HEAVY INDUSTRIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; MASKS; MEMS; MICROSTRUCTURE; POLYMETHYL METHACRYLATES; SILICON CARBIDE; SILICON COMPOUNDS; SILICON WAFERS; SYNCHROTRON RADIATION; X RAY LITHOGRAPHY; X RAYS;

DEEP X-RAY LITHOGRAPHY; HIGH ASPECT RATIO; LIGA PROCESS; MICRO ELECTROMECHANICAL SYSTEM (MEMS); MICRO PART; NI MICROSTRUCTURE; PMMA RESINS; X RAY MASK;

ASPECT RATIO;

EID: 85024454807     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MHS.1997.768856     Document Type: Conference Paper

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