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Volumn 7, Issue 11, 2016, Pages 6760-6767

Tantalum nitride films integrated with transparent conductive oxide substrates: Via atomic layer deposition for photoelectrochemical water splitting

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; CONDUCTIVE FILMS; DEPOSITION; ELECTROCHEMISTRY; NITRIDES; OXIDE FILMS; SOLAR ENERGY; SUBSTRATES; TANTALUM COMPOUNDS; TANTALUM OXIDES;

EID: 84992200635     PISSN: 20416520     EISSN: 20416539     Source Type: Journal    
DOI: 10.1039/c6sc02116f     Document Type: Article
Times cited : (54)

References (44)
  • 26
    • 84992223986 scopus 로고    scopus 로고
    • X-ray and Image Analysis
    • Princeton Gamma-Tech, Princeton, 2nd edn
    • J. J. Friel, X-ray and Image Analysis, in Electron Microscopy, Princeton Gamma-Tech, Princeton, 2nd edn, 2003
    • (2003) Electron Microscopy
    • Friel, J.J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.