Ta3N5 and TaON thin films on Ta foil: Surface composition and stability

Journal of Physical Chemistry B

Volumn 107, Issue 48, 2003, Pages 13441-13445

  Hara, Michikazu ^a   Chiba, Eisuke ^a   Ishikawa, Akio ^a   Takata, Tsuyoshi ^a   Kondo, Junko N ^a   Domen, Kazunari ^a,b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; DECOMPOSITION; HYDROLYSIS; METAL FOIL; NITRIDING; OXIDATION; PHOTOCATALYSIS; REDUCTION; STOICHIOMETRY; SURFACE STRUCTURE; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

DENSITY FUNCTIONAL THEORY; NITRIDATION; TANTALUM NITRIDE; TANTALUN OXYNITRIDE; VISIBLE LIGHT-RESPONSIVE PHOTOCATALYST;

TANTALUM COMPOUNDS;

EID: 0346947078     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp036189t     Document Type: Article

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