NIOSH field studies team assessment: Worker exposure to aerosolized metal oxide nanoparticles in a semiconductor fabrication facility

Journal of Occupational and Environmental Hygiene

Volumn 13, Issue 11, 2016, Pages 871-880

  Brenner, Sara A ^a   Neu Baker, Nicole M ^a   Eastlake, Adrienne C ^b   Beaucham, Catherine C ^b   Geraci, Charles L ^b  

^a SUNY POLYTECHNIC INSTITUTE   (United States)

^b NATIONAL INSTITUTE FOR OCCUPATIONAL SAFETY AND HEALTH   (United States)

Author keywords

Chemical mechanical planarization; engineered nanomaterials; NEAT 2.0; occupational exposure assessment; semiconductor fabrication; uncharacterized occupational health hazard

Indexed keywords

AIR POLLUTANT; METAL NANOPARTICLE;

AIR POLLUTANT; ANALYSIS; ENVIRONMENTAL MONITORING; EXPOSURE; HUMAN; NANOTECHNOLOGY; OCCUPATIONAL EXPOSURE; OCCUPATIONAL HEALTH SERVICE; PARTICLE SIZE; PROCEDURES; SEMICONDUCTOR; UNITED STATES; WORKPLACE;

AIR POLLUTANTS, OCCUPATIONAL; ENVIRONMENTAL MONITORING; HUMANS; INHALATION EXPOSURE; METAL NANOPARTICLES; NANOTECHNOLOGY; NATIONAL INSTITUTE FOR OCCUPATIONAL SAFETY AND HEALTH (U.S.); OCCUPATIONAL EXPOSURE; PARTICLE SIZE; SEMICONDUCTORS; UNITED STATES; WORKPLACE;

EID: 84988349786     PISSN: 15459624     EISSN: 15459632     Source Type: Journal    
DOI: 10.1080/15459624.2016.1183015     Document Type: Article

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