-
1
-
-
84896283359
-
-
D. Ye, S. Q. Wu, Y. Yu, L. Liu, X. P. Lu, and Y. Wu, Appl. Phys. Lett. 104, 1031051 (2014). 10.1063/1.4875959
-
(2014)
Appl. Phys. Lett.
, vol.104
-
-
Ye, D.1
Wu, S.Q.2
Yu, Y.3
Liu, L.4
Lu, X.P.5
Wu, Y.6
-
2
-
-
26244451229
-
-
K. Ostrikov, Rev. Mod. Phys. 77 (2), 489-511 (2005). 10.1103/RevModPhys.77.489
-
(2005)
Rev. Mod. Phys.
, vol.77
, Issue.2
, pp. 489-511
-
-
Ostrikov, K.1
-
4
-
-
84908419291
-
-
J. Kredl, S. Drache, A. Quade, M. Polak, S. Müller, S. Peglow, R. Hippler, and J. F. Kolb, IEEE Trans. Plasma Sci. 42 (10), 2756-2757 (2014). 10.1109/TPS.2014.2325956
-
(2014)
IEEE Trans. Plasma Sci.
, vol.42
, Issue.10
, pp. 2756-2757
-
-
Kredl, J.1
Drache, S.2
Quade, A.3
Polak, M.4
Müller, S.5
Peglow, S.6
Hippler, R.7
Kolb, J.F.8
-
5
-
-
84959503493
-
-
C. Stancu, D. Alegre, E. R. Ionita, B. Mitu, C. Grisolia, F. L. Tabares, and G. Dinescu, Fusion Eng. Des. 103, 38-44 (2016). 10.1016/j.fusengdes.2015.12.024
-
(2016)
Fusion Eng. Des.
, vol.103
, pp. 38-44
-
-
Stancu, C.1
Alegre, D.2
Ionita, E.R.3
Mitu, B.4
Grisolia, C.5
Tabares, F.L.6
Dinescu, G.7
-
6
-
-
84961611414
-
-
J. L. Hauser, D. T. Tran, E. T. Conley, J. M. Saunders, K. C. Bustillo, and S. R. J. Oliver, Chem. Mater. 28, 474 (2016). 10.1021/acs.chemmater.5b03018
-
(2016)
Chem. Mater.
, vol.28
, pp. 474
-
-
Hauser, J.L.1
Tran, D.T.2
Conley, E.T.3
Saunders, J.M.4
Bustillo, K.C.5
Oliver, S.R.J.6
-
7
-
-
84880162272
-
-
K. Ostrikov, E. C. Neyts, and M. Meyyappan, Adv. Phys. 62 (2), 113-224 (2013). 10.1080/00018732.2013.808047
-
(2013)
Adv. Phys.
, vol.62
, Issue.2
, pp. 113-224
-
-
Ostrikov, K.1
Neyts, E.C.2
Meyyappan, M.3
-
9
-
-
79959367718
-
-
A. Sarani, A. Y. Nikiforov, N. De Geyter, R. Morent, and C. Leys, Appl. Surf. Sci. 257 (20), 8737-8741 (2011). 10.1016/j.apsusc.2011.05.071
-
(2011)
Appl. Surf. Sci.
, vol.257
, Issue.20
, pp. 8737-8741
-
-
Sarani, A.1
Nikiforov, A.Y.2
De Geyter, N.3
Morent, R.4
Leys, C.5
-
11
-
-
84855291177
-
-
A. Sarani, N. De Geyter, A. Y. Nikiforov, R. Morent, C. Leys, J. Hubert, and F. Reniers, Surf. Coat. Technol. 206 (8-9), 2226-2232 (2012). 10.1016/j.surfcoat.2011.09.070
-
(2012)
Surf. Coat. Technol.
, vol.206
, Issue.8-9
, pp. 2226-2232
-
-
Sarani, A.1
De Geyter, N.2
Nikiforov, A.Y.3
Morent, R.4
Leys, C.5
Hubert, J.6
Reniers, F.7
-
12
-
-
80052969561
-
-
H. J. Lee, H. Jung, W. Choe, J. S. Ham, J. H. Lee, and C. Jo, Food Microbiol. 28 (8), 1468-1471 (2011). 10.1016/j.fm.2011.08.002
-
(2011)
Food Microbiol.
, vol.28
, Issue.8
, pp. 1468-1471
-
-
Lee, H.J.1
Jung, H.2
Choe, W.3
Ham, J.S.4
Lee, J.H.5
Jo, C.6
-
13
-
-
65549137615
-
-
S. Reuter, K. Niemi, V. Schulz-von der Gathen, and H. F. Döbele, Plasma Sources Sci. Technol. 18 (1), 015006 (2009). 10.1088/0963-0252/18/1/015006
-
(2009)
Plasma Sources Sci. Technol.
, vol.18
, Issue.1
-
-
Reuter, S.1
Niemi, K.2
Schulz-Von Der Gathen, V.3
Döbele, H.F.4
-
14
-
-
79958833409
-
-
Z. Xiong, T. Du, X. Lu, Y. Cao, and Y. Pan, Appl. Phys. Lett. 98 (22), 221503 (2011). 10.1063/1.3597622
-
(2011)
Appl. Phys. Lett.
, vol.98
, Issue.22
-
-
Xiong, Z.1
Du, T.2
Lu, X.3
Cao, Y.4
Pan, Y.5
-
15
-
-
84859608348
-
-
X. Pei, X. Lu, J. Liu, D. Liu, Y. Yang, K. Ostrikov, P. K. Chu, and Y. Pan, J. Phys. D: Appl. Phys. 45 (16), 165205 (2012). 10.1088/0022-3727/45/16/165205
-
(2012)
J. Phys. D: Appl. Phys.
, vol.45
, Issue.16
-
-
Pei, X.1
Lu, X.2
Liu, J.3
Liu, D.4
Yang, Y.5
Ostrikov, K.6
Chu, P.K.7
Pan, Y.8
-
16
-
-
84874951202
-
-
A. Lehmann, A. Rueppell, A. Schindler, I. M. Zylla, H. J. Seifert, F. Nothdurft, M. Hannig, and S. Rupf, Plasma Process. Polym. 10 (3), 262-270 (2013). 10.1002/ppap.201200088
-
(2013)
Plasma Process. Polym.
, vol.10
, Issue.3
, pp. 262-270
-
-
Lehmann, A.1
Rueppell, A.2
Schindler, A.3
Zylla, I.M.4
Seifert, H.J.5
Nothdurft, F.6
Hannig, M.7
Rupf, S.8
-
18
-
-
72049108098
-
-
D. Dobrynin, G. Fridman, G. Friedman, and A. Fridman, New J. Phys. 11 (11), 115020 (2009). 10.1088/1367-2630/11/11/115020
-
(2009)
New J. Phys.
, vol.11
, Issue.11
-
-
Dobrynin, D.1
Fridman, G.2
Friedman, G.3
Fridman, A.4
-
19
-
-
84888876952
-
-
J. Schlegel, J. Köritzer, and V. Boxhammer, Clin. Plasma Med. 1 (2), 2-7 (2013). 10.1016/j.cpme.2013.08.001
-
(2013)
Clin. Plasma Med.
, vol.1
, Issue.2
, pp. 2-7
-
-
Schlegel, J.1
Köritzer, J.2
Boxhammer, V.3
-
20
-
-
84855547956
-
-
X. Yan, Z. Xiong, F. Zou, S. Zhao, X. Lu, G. Yang, G. He, and K. K. Ostrikov, Plasma Process. Polym. 9 (1), 59-66 (2012). 10.1002/ppap.201100031
-
(2012)
Plasma Process. Polym.
, vol.9
, Issue.1
, pp. 59-66
-
-
Yan, X.1
Xiong, Z.2
Zou, F.3
Zhao, S.4
Lu, X.5
Yang, G.6
He, G.7
Ostrikov, K.K.8
-
21
-
-
84883450344
-
-
T. von Woedtke, S. Reuter, K. Masur, and K.-D. Weltmann, Phys. Rep. 530 (4), 291-320 (2013). 10.1016/j.physrep.2013.05.005
-
(2013)
Phys. Rep.
, vol.530
, Issue.4
, pp. 291-320
-
-
Von Woedtke, T.1
Reuter, S.2
Masur, K.3
Weltmann, K.-D.4
-
22
-
-
84864697178
-
-
H. M. Joh, S. J. Kim, T. H. Chung, and S. H. Leem, Appl. Phys. Lett. 101, 053703 (2012). 10.1063/1.4742742
-
(2012)
Appl. Phys. Lett.
, vol.101
-
-
Joh, H.M.1
Kim, S.J.2
Chung, T.H.3
Leem, S.H.4
-
23
-
-
84930211421
-
-
H. Zhang, Z. Xu, J. Shen, X. Li, L. Ding, J. Ma, Y. Lan, W. Xia, C. Cheng, Q. Sun, Z. Zhang, and P. K. Chu, Sci. Rep. 5, 10031 (2015). 10.1038/srep10031
-
(2015)
Sci. Rep.
, vol.5
, pp. 10031
-
-
Zhang, H.1
Xu, Z.2
Shen, J.3
Li, X.4
Ding, L.5
Ma, J.6
Lan, Y.7
Xia, W.8
Cheng, C.9
Sun, Q.10
Zhang, Z.11
Chu, P.K.12
-
24
-
-
84901494975
-
-
X. Lu, G. V. Naidis, M. Laroussi, and K. Ostrikov, Phys. Rep. 540 (3), 123-166 (2014). 10.1016/j.physrep.2014.02.006
-
(2014)
Phys. Rep.
, vol.540
, Issue.3
, pp. 123-166
-
-
Lu, X.1
Naidis, G.V.2
Laroussi, M.3
Ostrikov, K.4
-
26
-
-
63749121583
-
-
N. Mericam-Bourdet, M. Laroussi, A. Begum, and E. Karakas, J. Phys. D: Appl. Phys. 42 (5), 055207 (2009). 10.1088/0022-3727/42/5/055207
-
(2009)
J. Phys. D: Appl. Phys.
, vol.42
, Issue.5
-
-
Mericam-Bourdet, N.1
Laroussi, M.2
Begum, A.3
Karakas, E.4
-
29
-
-
79953672388
-
-
J. Oh, O. T. Olabanji, C. Hale, R. Mariani, K. Kontis, and J. W. Bradley, J. Phys. D: Appl. Phys. 44, 155206 (2011). 10.1088/0022-3727/44/15/155206
-
(2011)
J. Phys. D: Appl. Phys.
, vol.44
-
-
Oh, J.1
Olabanji, O.T.2
Hale, C.3
Mariani, R.4
Kontis, K.5
Bradley, J.W.6
-
30
-
-
84872551175
-
-
M. Ghasemi, P. Olszewski, J. W. Bradley, and J. L. Walsh, J. Phys. D: Appl. Phys. 46 (5), 052001 (2013). 10.1088/0022-3727/46/5/052001
-
(2013)
J. Phys. D: Appl. Phys.
, vol.46
, Issue.5
-
-
Ghasemi, M.1
Olszewski, P.2
Bradley, J.W.3
Walsh, J.L.4
-
31
-
-
84893668951
-
-
E. Robert, V. Sarron, T. Darny, D. Riès, S. Dozias, J. Fontane, L. Joly, and J.-M. Pouvesle, Plasma Sources Sci. Technol. 23 (1), 012003 (2014). 10.1088/0963-0252/23/1/012003
-
(2014)
Plasma Sources Sci. Technol.
, vol.23
, Issue.1
-
-
Robert, E.1
Sarron, V.2
Darny, T.3
Riès, D.4
Dozias, S.5
Fontane, J.6
Joly, L.7
Pouvesle, J.-M.8
-
32
-
-
84907611635
-
-
P. K. Papadopoulos, P. Vafeas, P. Svarnas, K. Gazeli, P. M. Hatzikonstantinou, A. Gkelios, and F. Clément, J. Phys. D: Appl. Phys. 47 (42), 425203 (2014). 10.1088/0022-3727/47/42/425203
-
(2014)
J. Phys. D: Appl. Phys.
, vol.47
, Issue.42
-
-
Papadopoulos, P.K.1
Vafeas, P.2
Svarnas, P.3
Gazeli, K.4
Hatzikonstantinou, P.M.5
Gkelios, A.6
Clément, F.7
-
33
-
-
84916227691
-
-
S. Zhang, A. Sobota, E. M. van Veldhuizen, and P. J. Bruggeman, J. Phys. D: Appl. Phys. 48 (1), 015203 (2015). 10.1088/0022-3727/48/1/015203
-
(2015)
J. Phys. D: Appl. Phys.
, vol.48
, Issue.1
-
-
Zhang, S.1
Sobota, A.2
Van Veldhuizen, E.M.3
Bruggeman, P.J.4
-
34
-
-
79959516527
-
-
N. Jiang, J. Yang, F. He, and Z. Cao, J. Appl. Phys. 109 (9), 093305 (2011). 10.1063/1.3581067
-
(2011)
J. Appl. Phys.
, vol.109
, Issue.9
-
-
Jiang, N.1
Yang, J.2
He, F.3
Cao, Z.4
-
35
-
-
84865249817
-
-
R. Xiong, Q. Xiong, A. Y. Nikiforov, P. Vanraes, and C. Leys, J. Appl. Phys. 112 (3), 033305 (2012). 10.1063/1.4746700
-
(2012)
J. Appl. Phys.
, vol.112
, Issue.3
-
-
Xiong, R.1
Xiong, Q.2
Nikiforov, A.Y.3
Vanraes, P.4
Leys, C.5
-
36
-
-
84904049451
-
-
M. Boselli, V. Colombo, E. Ghedini, M. Gherardi, R. Laurita, A. Liguori, P. Sanibondi, and A. Stancampiano, Plasma Chem. Plasma Process. 34 (4), 853-869 (2014). 10.1007/s11090-014-9537-1
-
(2014)
Plasma Chem. Plasma Process.
, vol.34
, Issue.4
, pp. 853-869
-
-
Boselli, M.1
Colombo, V.2
Ghedini, E.3
Gherardi, M.4
Laurita, R.5
Liguori, A.6
Sanibondi, P.7
Stancampiano, A.8
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