-
1
-
-
23044455785
-
-
1612-8850, 10.1002/ppa200400078
-
M. Laroussi, Plasma Processes Polym. 1612-8850 2, 391 (2005). 10.1002/ppap.200400078
-
(2005)
Plasma Processes Polym.
, vol.2
, pp. 391
-
-
Laroussi, M.1
-
2
-
-
72049111528
-
-
1367-2630, 10.1088/1367-2630/11/11/115012
-
M. Kong, G. Kroesen, G. Morfill, T. Nosenko, T. Shimizu, J. Dijk, and J. Zimmermann, New J. Phys. 1367-2630 11, 115012 (2009). 10.1088/1367-2630/11/11/ 115012
-
(2009)
New J. Phys.
, vol.11
, pp. 115012
-
-
Kong, M.1
Kroesen, G.2
Morfill, G.3
Nosenko, T.4
Shimizu, T.5
Dijk, J.6
Zimmermann, J.7
-
3
-
-
47249154736
-
-
0003-6951, 10.1063/1.2956411
-
Q. Nie, C. Ren, D. Wang, and J. Zhang, Appl. Phys. Lett. 0003-6951 93, 011503 (2008). 10.1063/1.2956411
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 011503
-
-
Nie, Q.1
Ren, C.2
Wang, D.3
Zhang, J.4
-
4
-
-
34250167937
-
-
1612-8850, 10.1002/ppa200600217
-
G. Fridman, A. Brooks, M. Galasubramanian, A. Fridman, A. Gutsol, V. Vasilets, H. Ayan, and G. Friedman, Plasma Processes Polym. 1612-8850 4, 370 (2007). 10.1002/ppap.200600217
-
(2007)
Plasma Processes Polym.
, vol.4
, pp. 370
-
-
Fridman, G.1
Brooks, A.2
Galasubramanian, M.3
Fridman, A.4
Gutsol, A.5
Vasilets, V.6
Ayan, H.7
Friedman, G.8
-
5
-
-
45749102465
-
-
0003-6951, 10.1063/1.2940325
-
J. Kolb, A. Mohamed, R. Price, R. Swanson, A. Bowman, R. Chiavarini, M. Stacey, and K. Schoenbach, Appl. Phys. Lett. 0003-6951 92, 241501 (2008). 10.1063/1.2940325
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 241501
-
-
Kolb, J.1
Mohamed, A.2
Price, R.3
Swanson, R.4
Bowman, A.5
Chiavarini, R.6
Stacey, M.7
Schoenbach, K.8
-
6
-
-
55849133398
-
-
0003-6951, 10.1063/1.3020223
-
A. Shashurin, M. Keidar, S. Bronnikov, R. A. Jurjus, and M. A. Stepp, Appl. Phys. Lett. 0003-6951 93, 181501 (2008). 10.1063/1.3020223
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 181501
-
-
Shashurin, A.1
Keidar, M.2
Bronnikov, S.3
Jurjus, R.A.4
Stepp, M.A.5
-
7
-
-
33751558978
-
Uniformity of postprocessing of dense nanotube arrays by neutral and ion fluxes
-
DOI 10.1063/1.2388941
-
I. Levchenko, K. Ostrikov, and E. Tam, Appl. Phys. Lett. 0003-6951 89, 223108 (2006). 10.1063/1.2388941 (Pubitemid 44847595)
-
(2006)
Applied Physics Letters
, vol.89
, Issue.22
, pp. 223108
-
-
Levchenko, I.1
Ostrikov, K.2
Tam, E.3
-
8
-
-
42349098604
-
Nonequilibrium and effect of gas mixtures in an atmospheric microplasma
-
DOI 10.1063/1.2912039
-
D. Mariotti, Appl. Phys. Lett. 0003-6951 92, 151505 (2008). 10.1063/1.2912039 (Pubitemid 351555684)
-
(2008)
Applied Physics Letters
, vol.92
, Issue.15
, pp. 151505
-
-
Mariotti, D.1
-
9
-
-
71049180705
-
-
0003-6951, 10.1063/1.3258071
-
X. Lu, Z. Xiong, F. Zhao, Y. Xian, Q. Xiong, W. Gong, C. Zou, Z. Jiang, and Y. Pan, Appl. Phys. Lett. 0003-6951 95, 181501 (2009). 10.1063/1.3258071
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 181501
-
-
Lu, X.1
Xiong, Z.2
Zhao, F.3
Xian, Y.4
Xiong, Q.5
Gong, W.6
Zou, C.7
Jiang, Z.8
Pan, Y.9
-
10
-
-
71549133999
-
-
0003-6951, 10.1063/1.3267142
-
H. Kim, A. Brockhaus, and J. Engemann, Appl. Phys. Lett. 0003-6951 95, 211501 (2009). 10.1063/1.3267142
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 211501
-
-
Kim, H.1
Brockhaus, A.2
Engemann, J.3
-
11
-
-
70350648238
-
-
0022-3727, 10.1088/0022-3727/42/20/202002
-
W. Zhu, Q. Li, X. Zhu, and Y. Pu, J. Phys. D: Appl. Phys. 0022-3727 42, 202002 (2009). 10.1088/0022-3727/42/20/202002
-
(2009)
J. Phys. D: Appl. Phys.
, vol.42
, pp. 202002
-
-
Zhu, W.1
Li, Q.2
Zhu, X.3
Pu, Y.4
-
12
-
-
63649144064
-
-
0022-3727, 10.1088/0022-3727/42/3/032005
-
G. Kim, G. Kim, S. Park, S. Jeon, H. Seo, F. Iza, and J. Lee, J. Phys. D: Appl. Phys. 0022-3727 42, 032005 (2009). 10.1088/0022-3727/42/3/032005
-
(2009)
J. Phys. D: Appl. Phys.
, vol.42
, pp. 032005
-
-
Kim, G.1
Kim, G.2
Park, S.3
Jeon, S.4
Seo, H.5
Iza, F.6
Lee, J.7
-
13
-
-
67650300503
-
-
0093-3813, 10.1109/TPS.2009.2017267
-
M. Laroussi, IEEE Trans. Plasma Sci. 0093-3813 37, 714 (2009). 10.1109/TPS.2009.2017267
-
(2009)
IEEE Trans. Plasma Sci.
, vol.37
, pp. 714
-
-
Laroussi, M.1
-
14
-
-
78650196691
-
-
0093-3813, 10.1109/TPS.2010.2082571
-
S. Wu, X. Lu, and Z. Xiong, IEEE Trans. Plasma Sci. 0093-3813 38, 3404 (2010). 10.1109/TPS.2010.2082571
-
(2010)
IEEE Trans. Plasma Sci.
, vol.38
, pp. 3404
-
-
Wu, S.1
Lu, X.2
Xiong, Z.3
-
15
-
-
42349085395
-
A single electrode room-temperature plasma jet device for biomedical applications
-
DOI 10.1063/1.2912524
-
X. Lu, Z. Jiang, Q. Xiong, Z. Tang, and Y. Pan, Appl. Phys. Lett. 0003-6951 92, 151504 (2008). 10.1063/1.2912524 (Pubitemid 351555683)
-
(2008)
Applied Physics Letters
, vol.92
, Issue.15
, pp. 151504
-
-
Lu, X.1
Jiang, Z.2
Xiong, Q.3
Tang, Z.4
Pan, Y.5
-
16
-
-
24944572288
-
Room-temperature atmospheric pressure plasma plume for biomedical applications
-
DOI 10.1063/1.2045549, 113902
-
M. Laroussi and X. Lu, Appl. Phys. Lett. 0003-6951 87, 113902 (2005). 10.1063/1.2045549 (Pubitemid 41330911)
-
(2005)
Applied Physics Letters
, vol.87
, Issue.11
, pp. 1-3
-
-
Laroussi, M.1
Lu, X.2
-
17
-
-
52349092422
-
-
0003-6951, 10.1063/1.2982497
-
J. Walsh and M. Kong, Appl. Phys. Lett. 0003-6951 93, 111501 (2008). 10.1063/1.2982497
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 111501
-
-
Walsh, J.1
Kong, M.2
-
18
-
-
7244242196
-
-
0093-3813, 10.1109/TPS.2004.832636
-
R. Sladek, E. Stoffels, R. Walraven, P. Tielbeek, and R. Koolhoven, IEEE Trans. Plasma Sci. 0093-3813 32, 1540 (2004). 10.1109/TPS.2004.832636
-
(2004)
IEEE Trans. Plasma Sci.
, vol.32
, pp. 1540
-
-
Sladek, R.1
Stoffels, E.2
Walraven, R.3
Tielbeek, P.4
Koolhoven, R.5
-
19
-
-
72049108098
-
-
1367-2630, 10.1088/1367-2630/11/11/115020
-
D. Dobrynin, G. Fridman, and G. Friedman, New J. Phys. 1367-2630 11, 115020 (2009). 10.1088/1367-2630/11/11/115020
-
(2009)
New J. Phys.
, vol.11
, pp. 115020
-
-
Dobrynin, D.1
Fridman, G.2
Friedman, G.3
-
20
-
-
63649143060
-
-
0022-3727, 10.1088/0022-3727/42/5/053001
-
P. Bruggeman and C. Leys, J. Phys. D: Appl. Phys. 0022-3727 42, 053001 (2009). 10.1088/0022-3727/42/5/053001
-
(2009)
J. Phys. D: Appl. Phys.
, vol.42
, pp. 053001
-
-
Bruggeman, P.1
Leys, C.2
-
21
-
-
33750602378
-
The preliminary discharging characterization of a novel APGD plume and its application in organic contaminant degradation
-
DOI 10.1088/0963-0252/15/4/002, PII S0963025206217511, 002
-
G. Chen, S. Chen, M. Zhou, W. Feng, W. Gu, and S. Yang, Plasma Sources Sci. Technol. 0963-0252 15, 603 (2006). 10.1088/0963-0252/15/4/002 (Pubitemid 44679403)
-
(2006)
Plasma Sources Science and Technology
, vol.15
, Issue.4
, pp. 603-608
-
-
Chen, G.1
Chen, S.2
Zhou, M.3
Feng, W.4
Gu, W.5
Yang, S.6
-
22
-
-
50249110229
-
-
0093-3813, 10.1109/TPS.2008.922488
-
Z. Machala, I. Jedlovsky, and V. Martisovits, IEEE Trans. Plasma Sci. 0093-3813 36, 918 (2008). 10.1109/TPS.2008.922488
-
(2008)
IEEE Trans. Plasma Sci.
, vol.36
, pp. 918
-
-
MacHala, Z.1
Jedlovsky, I.2
Martisovits, V.3
-
23
-
-
77950210567
-
-
1612-8850, 10.1002/ppa200900079
-
J. Choi, A. Mohamed, K. Woo, J. Lee, and K. Kim, Plasma Processes Polym. 1612-8850 7, 258 (2010). 10.1002/ppap.200900079
-
(2010)
Plasma Processes Polym.
, vol.7
, pp. 258
-
-
Choi, J.1
Mohamed, A.2
Woo, K.3
Lee, J.4
Kim, K.5
-
24
-
-
51849157324
-
-
0021-8979, 10.1063/1.2977674
-
X. Lu, T. Ye, Y. Cao, Z. Sun, Q. Xiong, Z. Tang, Z. Xiong, J. Hu, Z. Jiang, and Y. Pan, J. Appl. Phys. 0021-8979 104, 053309 (2008). 10.1063/1.2977674
-
(2008)
J. Appl. Phys.
, vol.104
, pp. 053309
-
-
Lu, X.1
Ye, T.2
Cao, Y.3
Sun, Z.4
Xiong, Q.5
Tang, Z.6
Xiong, Z.7
Hu, J.8
Jiang, Z.9
Pan, Y.10
-
25
-
-
54149093734
-
-
1612-8850, 10.1002/ppa200700154
-
G. Fridman, G. Friedman, A. Gutsol, A. B. Shekhter, V. N. Vasilets, and A. Fridman, Plasma Processes Polym. 1612-8850 5, 503 (2008). 10.1002/ppap.200700154
-
(2008)
Plasma Processes Polym.
, vol.5
, pp. 503
-
-
Fridman, G.1
Friedman, G.2
Gutsol, A.3
Shekhter, A.B.4
Vasilets, V.N.5
Fridman, A.6
-
26
-
-
33750588833
-
Plasma needle for in vivo medical treatment: Recent developments and perspectives
-
DOI 10.1088/0963-0252/15/4/S03, PII S0963025206047517, S03
-
E. Stoffels, I. Kieft, R. Sladek, L. Bedem, E. Laan, and M. Steinbuch, Plasma Sources Sci. Technol. 0963-0252 15, S169 (2006). 10.1088/0963-0252/15/4/ S03 (Pubitemid 44679440)
-
(2006)
Plasma Sources Science and Technology
, vol.15
, Issue.4
-
-
Stoffels, E.1
Kieft, I.E.2
Sladek, R.E.J.3
Van Den Bedem, L.J.M.4
Van Der Laan, E.P.5
Steinbuch, M.6
-
27
-
-
77956614737
-
-
0093-3813, 10.1109/TPS.2010.2056393
-
X. Yan, F. Zou, S. Zhao, X. Lu, G. He, Z. Xiong, Q. Xiong, Q. Zhao, P. Deng, J. Huang, and G. Yang, IEEE Trans. Plasma Sci. 0093-3813 38, 2451 (2010). 10.1109/TPS.2010.2056393
-
(2010)
IEEE Trans. Plasma Sci.
, vol.38
, pp. 2451
-
-
Yan, X.1
Zou, F.2
Zhao, S.3
Lu, X.4
He, G.5
Xiong, Z.6
Xiong, Q.7
Zhao, Q.8
Deng, P.9
Huang, J.10
Yang, G.11
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