Fabrication of topographically microstructured titanium silicide interface for advanced photonic applications

Scripta Materialia

Volumn 119, Issue , 2016, Pages 76-81

  Hannula, M ^a   Lahtonen, K ^a   Ali Loytty H ^a   Zakharov, A A ^b   Isotalo, T ^a   Saari, J ^a   Valden, M ^a  

^a TAMPERE UNIVERSITY OF TECHNOLOGY   (Finland)

^b LUND UNIVERSITY   (Sweden)

Author keywords

Atomic layer deposition (ALD); Semiconductors; Surface modification; Transition metal silicides; X ray photoelectron spectroscopy (XPS)

Indexed keywords

ATOMIC LAYER DEPOSITION; CHARGE TRANSFER; DEPOSITION; MICROSTRUCTURE; SEMICONDUCTOR MATERIALS; SILICIDES; SURFACE TREATMENT; TITANIUM; TITANIUM COMPOUNDS; TITANIUM DIOXIDE; TRANSITION METAL COMPOUNDS; TRANSITION METALS; ULTRATHIN FILMS;

HIGH TEMPERATURE; ISLAND FORMATION; PHOTOELECTROCHEMICAL APPLICATIONS; PHOTOEMISSION ELECTRON MICROSCOPY; PHOTONIC APPLICATION; POSTGROWTH ANNEALING; TITANIUM SILICIDE; TRANSITION METAL SILICIDES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84963553679     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2016.03.016     Document Type: Article

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