Site-Selective Passivation of Defects in NiO Solar Photocathodes by Targeted Atomic Deposition

ACS Applied Materials and Interfaces

Volumn 8, Issue 7, 2016, Pages 4754-4761

  Flynn, Cory J ^a   McCullough, Shannon M ^a   Oh, Eunbi ^a   Li, Lesheng ^a   Mercado, Candy C ^b   Farnum, Byron H ^a   Li, Wentao ^a   Donley, Carrie L ^a   You, Wei ^a   Nozik, Arthur J ^b,c   McBride, James R ^d   Meyer, Thomas J ^a   Kanai, Yosuke ^a   Cahoon, James F ^a  

^a The University of North Carolina at Chapel Hill   (United States)

^b UNIVERSITY OF COLORADO   (United States)

^c NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

^d VANDERBILT UNIVERSITY   (United States)

Author keywords

atomic layer deposition; DFT+U calculations; dye sensitized solar cell; nickel oxide; p type metal oxide

Indexed keywords

ATOMIC LAYER DEPOSITION; ATOMS; CARRIER MOBILITY; CHARGE CARRIERS; DANGLING BONDS; DEPOSITION; DYE-SENSITIZED SOLAR CELLS; FIELD EMISSION CATHODES; METALS; NANOSTRUCTURED MATERIALS; NICKEL; NICKEL OXIDE; SEMICONDUCTOR DOPING; SOLAR CELLS; SOLAR ENERGY; SURFACE CHEMISTRY; VAPOR DEPOSITION;

DFT + U CALCULATIONS; ELECTRICAL MOBILITY; METAL OXIDES; SELECTIVE REACTIONS; SEMICONDUCTOR NANOMATERIALS; SOLAR ENERGY APPLICATIONS; VAPOR PHASE PRECURSORS; VOLATILE PRECURSORS;

SURFACE DEFECTS;

EID: 84962612518     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/acsami.6b01090     Document Type: Article

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