Ion implanted passivated contacts for interdigitated back contacted solar cells

2015 IEEE 42nd Photovoltaic Specialist Conference, PVSC 2015

Volumn , Issue , 2015, Pages

  Young, David L ^a   Nemeth, William ^a   Lasalvia, Vincenzo ^a   Reedy, Robert ^a   Bateman, Nicholas ^b   Stradins, Pauls ^a  

^a NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

^b APPLIED MATERIALS INC   (United States)

Author keywords

Contacts; ion implantation; photovoltaic cells; silicon

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; CONTACTS (FLUID MECHANICS); IONS; PASSIVATION; PHOTOELECTROCHEMICAL CELLS; PHOTOVOLTAIC CELLS; SILICON; SILICON OXIDES; SILICON SOLAR CELLS; SILICON WAFERS; SOLAR CELLS;

AMORPHOUS SI FILMS; AMORPHOUS SILICON (A-SI); ANNEALING TEMPERATURES; CONTACT RESISTIVITIES; ION IMPLANTED; N-TYPE CONTACTS; P-TYPE CONTACT; RECOMBINATION PARAMETERS;

ION IMPLANTATION;

EID: 84961661735     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2015.7356141     Document Type: Conference Paper

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