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Proceedings of the International Conference on Ion Implantation Technology

Volumn 22-27-September-2002, Issue , 2002, Pages 560-563

Study of damage formation by low-energy boron cluster ion implantation

(3) Aoki, Takaaki a,b Matsuo, Jiro a Takaoka, Gikan a

a KYOTO UNIVERSITY (Japan)

b Collaborative Research Center for Cluster Ion Beam Process Technology ^* (Japan)

Author keywords

Boron cluster; Clusster ion beam; Damage formation; Decabrane; Molecular dynamics simulation; RBS measurement

Indexed keywords

BORON; DEFECTS; ION BEAMS; ION BOMBARDMENT; ION IMPLANTATION; MOLECULAR DYNAMICS; MONOMERS; SUBSTRATES;

ACTIVATION MECHANISMS; BORON CLUSTERS; CLUSTER IMPLANTATION; CLUSTER ION IMPLANTATION; DAMAGE FORMATION; DECABRANE; MOLECULAR DYNAMICS SIMULATIONS; SILICON SUBSTRATES;

IONS;

EID: 84961342715 PISSN: None EISSN: None Source Type: Conference Proceeding
DOI: 10.1109/IIT.2002.1258066 Document Type: Conference Paper

Times cited : (5)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.