Molecular dynamics study of implant and damage formation in low-energy boron cluster ion implantation

Proceedings of the International Conference on Ion Implantation Technology

Volumn 2, Issue , 1999, Pages 1254-1257

  Aoki, Takaaki ^a   Matsuo, Jiro ^a   Insepov, Zinetulla ^a   Yamada, Isao ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; MOLECULAR DYNAMICS; MONOMERS; SEMICONDUCTING BORON; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR JUNCTIONS; SUBSTRATES;

DECABORANE;

ION IMPLANTATION;

EID: 0033311975     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)