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ChemElectroChem

Volumn 1, Issue 1, 2014, Pages

Lithium insertion/deinsertion characteristics of nanostructured amorphous tantalum oxide thin films

(6) Dang, Hoang X a Lin, Yong Mao a Klavetter, Kyle C a Cell, Trevor H a Heller, Adam a Buddie Mullins, C a

a The University of Texas at Austin (United States)

Author keywords

Lithium batteries; Nanoporous structures; Reactive ballistic deposition; Tantalum oxide; Thin films

Indexed keywords

DEPOSITION; LITHIUM BATTERIES; MORPHOLOGY; OXIDE FILMS; TANTALUM OXIDES;

BALLISTIC DEPOSITION; COULOMBIC EFFICIENCY; LITHIATION/DELITHIATION; LITHIUM INSERTION; MORPHOLOGY-CONTROLLED; NANO-STRUCTURED; NANOPOROUS STRUCTURES; OXIDE THIN FILMS;

THIN FILMS;

EID: 84957946366 PISSN: None EISSN: 21960216 Source Type: Journal
DOI: 10.1002/celc.201300139 Document Type: Article

Times cited : (19)

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