-
2
-
-
84954372583
-
-
Hsu, B. B.-Y.; Cheng, C.-M.; Luo, C.; Patel, S. N.; Zhong, C.; Sun, H.; Sherman, J.; Lee, B. H.; Ying, L.; Wang, M.; Bazan, G.; Chabinyc, M.; Brédas, J.-L.; Heeger, A. Adv. Mater. 2015, 10.1002/adma.201502820
-
(2015)
Adv. Mater.
-
-
Hsu, B.B.-Y.1
Cheng, C.-M.2
Luo, C.3
Patel, S.N.4
Zhong, C.5
Sun, H.6
Sherman, J.7
Lee, B.H.8
Ying, L.9
Wang, M.10
Bazan, G.11
Chabinyc, M.12
Brédas, J.-L.13
Heeger, A.14
-
3
-
-
84901024792
-
-
Tseng, H.-R.; Phan, H.; Luo, C.; Wang, M.; Perez, L. A.; Patel, S. N.; Ying, L.; Kramer, E. J.; Nguyen, T.-Q.; Bazan, G. C.; Heeger, A. J. Adv. Mater. 2014, 26, 2993 10.1002/adma.201305084
-
(2014)
Adv. Mater.
, vol.26
, pp. 2993
-
-
Tseng, H.-R.1
Phan, H.2
Luo, C.3
Wang, M.4
Perez, L.A.5
Patel, S.N.6
Ying, L.7
Kramer, E.J.8
Nguyen, T.-Q.9
Bazan, G.C.10
Heeger, A.J.11
-
4
-
-
84870900674
-
-
Tseng, H.-R.; Ying, L.; Hsu, B. B. Y.; Perez, L. A.; Takacs, C. J.; Bazan, G. C.; Heeger, A. J. Nano Lett. 2012, 12, 6353 10.1021/nl303612z
-
(2012)
Nano Lett.
, vol.12
, pp. 6353
-
-
Tseng, H.-R.1
Ying, L.2
Hsu, B.B.Y.3
Perez, L.A.4
Takacs, C.J.5
Bazan, G.C.6
Heeger, A.J.7
-
5
-
-
84900496356
-
-
Luo, C.; Kyaw, A. K. K.; Perez, L. A.; Patel, S.; Wang, M.; Grimm, B.; Bazan, G. C.; Kramer, E. J.; Heeger, A. J. Nano Lett. 2014, 14, 2764 10.1021/nl500758w
-
(2014)
Nano Lett.
, vol.14
, pp. 2764
-
-
Luo, C.1
Kyaw, A.K.K.2
Perez, L.A.3
Patel, S.4
Wang, M.5
Grimm, B.6
Bazan, G.C.7
Kramer, E.J.8
Heeger, A.J.9
-
7
-
-
34748874769
-
-
Sharpe, Jr. W. N., ; Pulskamp, J.; Gianola, D. S.; Eberl, C.; Polcawich, R. G.; Thompson, R. J. Exp. Mech. 2007, 47, 649 10.1007/s11340-006-9010-z
-
(2007)
Exp. Mech.
, vol.47
, pp. 649
-
-
Sharpe, W.N.1
Pulskamp, J.2
Gianola, D.S.3
Eberl, C.4
Polcawich, R.G.5
Thompson, R.J.6
-
8
-
-
34250642011
-
-
Guo, L. J. Adv. Mater. 2007, 19, 495 10.1002/adma.200600882
-
(2007)
Adv. Mater.
, vol.19
, pp. 495
-
-
Guo, L.J.1
-
9
-
-
84922848543
-
Soft UV Nanoimprint Lithography: A Versatile Tool for Nanostructuration at the 20nm Scale
-
Ed. InTech: New York.
-
Cattoni, A.; Chen, J.; Decanini, D.e; Shi, J.; Haghiri-Gosnet, A.-M. Soft UV Nanoimprint Lithography: A Versatile Tool for Nanostructuration at the 20nm Scale. Recent Advances in Nanofabrication Techniques and Applications; Cui, B., Ed.; InTech: New York, 2011.
-
(2011)
Recent Advances in Nanofabrication Techniques and Applications
-
-
Cattoni, A.1
Chen, J.2
Decanini, D.E.3
Shi, J.4
Haghiri-Gosnet, A.-M.5
Cui, B.6
-
11
-
-
66849129150
-
-
Roberts, M. E.; Queraltó, N.; Mannsfeld, S. C. B.; Reinecke, B. N.; Knoll, W.; Bao, Z. Chem. Mater. 2009, 21, 2292 10.1021/cm900637p
-
(2009)
Chem. Mater.
, vol.21
, pp. 2292
-
-
Roberts, M.E.1
Queraltó, N.2
Mannsfeld, S.C.B.3
Reinecke, B.N.4
Knoll, W.5
Bao, Z.6
-
12
-
-
84925246854
-
-
Yuan, Y.; Giri, G.; Ayzner, A. L.; Zoombelt, A. P.; Mannsfeld, S. C. B.; Chen, J.; Nordlund, D.; Toney, M. F.; Huang, J.; Bao, Z. Nat. Commun. 2014, 5, 3005 10.1038/ncomms4005
-
(2014)
Nat. Commun.
, vol.5
, pp. 3005
-
-
Yuan, Y.1
Giri, G.2
Ayzner, A.L.3
Zoombelt, A.P.4
Mannsfeld, S.C.B.5
Chen, J.6
Nordlund, D.7
Toney, M.F.8
Huang, J.9
Bao, Z.10
-
13
-
-
84922848541
-
Soft UV Nanoimprint Lithography and Its Applications
-
Eds. InTech: New York
-
Lan, H. Soft UV Nanoimprint Lithography and Its Applications. Updates in Advanced Lithography; Hosaka, S., Eds.; InTech: New York, 2013
-
(2013)
Updates in Advanced Lithography
-
-
Lan, H.1
Hosaka, S.2
-
14
-
-
84862828161
-
Mechanical Characteristics of the Hard-Polydimethylsiloxane for Smart Lithography
-
In; Yoo, S.-D. Ed. Springer: Berlin Heidelberg, Vol.
-
Kim, K.-h.; Song, N.-y.; Choo, B.-k.; Pribat, D.; Jang, J.; Park, K.-c., Mechanical Characteristics of the Hard-Polydimethylsiloxane for Smart Lithography. In EKC2008 Proceedings of the EU-Korea Conference on Science and Technology; Yoo, S.-D., Ed. Springer: Berlin Heidelberg, 2008; Vol. 124, pp 229.
-
(2008)
EKC2008 Proceedings of the EU-Korea Conference on Science and Technology
, vol.124
, pp. 229
-
-
Kim K.-h.1
Song N.-y.2
Choo B.-k.3
Pribat, D.4
Jang, J.5
Park K.-c.6
-
15
-
-
84894674552
-
-
Perez, L. A.; Zalar, P.; Ying, L.; Schmidt, K.; Toney, M. F.; Nguyen, T.-Q.; Bazan, G. C.; Kramer, E. J. Macromolecules 2014, 47, 1403 10.1021/ma4019679
-
(2014)
Macromolecules
, vol.47
, pp. 1403
-
-
Perez, L.A.1
Zalar, P.2
Ying, L.3
Schmidt, K.4
Toney, M.F.5
Nguyen, T.-Q.6
Bazan, G.C.7
Kramer, E.J.8
-
16
-
-
0032021761
-
-
Horowitz, G. Adv. Mater. 1998, 10, 365 10.1002/(SICI)1521-4095(199803)10:5<365::AID-ADMA365>3.0.CO;2-U
-
(1998)
Adv. Mater.
, vol.10
, pp. 365
-
-
Horowitz, G.1
-
17
-
-
76149106127
-
-
Letizia, J. A.; Rivnay, J.; Facchetti, A.; Ratner, M. A.; Marks, T. J. Adv. Funct. Mater. 2010, 20, 50 10.1002/adfm.200900831
-
(2010)
Adv. Funct. Mater.
, vol.20
, pp. 50
-
-
Letizia, J.A.1
Rivnay, J.2
Facchetti, A.3
Ratner, M.A.4
Marks, T.J.5
-
18
-
-
77955411861
-
-
Smith, J.; Hamilton, R.; Qi, Y.; Kahn, A.; Bradley, D. D. C.; Heeney, M.; McCulloch, I.; Anthopoulos, T. D. Adv. Funct. Mater. 2010, 20, 2330 10.1002/adfm.201000427
-
(2010)
Adv. Funct. Mater.
, vol.20
, pp. 2330
-
-
Smith, J.1
Hamilton, R.2
Qi, Y.3
Kahn, A.4
Bradley, D.D.C.5
Heeney, M.6
McCulloch, I.7
Anthopoulos, T.D.8
-
20
-
-
84863725626
-
-
Park, S.; Wang, G.; Cho, B.; Kim, Y.; Song, S.; Ji, Y.; Yoon, M.-H.; Lee, T. Nat. Nanotechnol. 2012, 7, 438 10.1038/nnano.2012.81
-
(2012)
Nat. Nanotechnol.
, vol.7
, pp. 438
-
-
Park, S.1
Wang, G.2
Cho, B.3
Kim, Y.4
Song, S.5
Ji, Y.6
Yoon, M.-H.7
Lee, T.8
-
21
-
-
84868281437
-
-
Li, J.; Zhao, Y.; Tan, H. S.; Guo, Y.; Di, C.-A.; Yu, G.; Liu, Y.; Lin, M.; Lim, S. H.; Zhou, Y.; Su, H.; Ong, B. S. Sci. Rep. 2012, 2, 754 10.1038/srep00754
-
(2012)
Sci. Rep.
, vol.2
, pp. 754
-
-
Li, J.1
Zhao, Y.2
Tan, H.S.3
Guo, Y.4
Di, C.-A.5
Yu, G.6
Liu, Y.7
Lin, M.8
Lim, S.H.9
Zhou, Y.10
Su, H.11
Ong, B.S.12
-
22
-
-
84879089628
-
-
Yoon, J.-Y.; Jeong, S.; Lee, S. S.; Kim, Y. H.; Ka, J.-W.; Yi, M. H.; Jang, K.-S. ACS Appl. Mater. Interfaces 2013, 5, 5149 10.1021/am400996q
-
(2013)
ACS Appl. Mater. Interfaces
, vol.5
, pp. 5149
-
-
Yoon, J.-Y.1
Jeong, S.2
Lee, S.S.3
Kim, Y.H.4
Ka, J.-W.5
Yi, M.H.6
Jang, K.-S.7
-
23
-
-
84878986748
-
-
Jang, K.-S.; Wee, D.; Kim, Y. H.; Kim, J.; Ahn, T.; Ka, J.-W.; Yi, M. H. Langmuir 2013, 29, 7143 10.1021/la401356u
-
(2013)
Langmuir
, vol.29
, pp. 7143
-
-
Jang, K.-S.1
Wee, D.2
Kim, Y.H.3
Kim, J.4
Ahn, T.5
Ka, J.-W.6
Yi, M.H.7
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